Fabrication of deep-etched fused silica grating with high depth-to-width ratio by holograph and ion-beam etching

Manman Sun; Shuhu Huan; Zhiwen Chen; Hengbo Li; Liangcheng Yu; Keqiang Qiu

doi:10.1117/12.2665859

4 April 2023 Fabrication of deep-etched fused silica grating with high depth-to-width ratio by holograph and ion-beam etching

Manman Sun, Shuhu Huan, Zhiwen Chen, Hengbo Li, Liangcheng Yu, Keqiang Qiu

Author Affiliations +

Proceedings Volume 12617, Ninth Symposium on Novel Photoelectronic Detection Technology and Applications; 1261738 (2023) https://doi.org/10.1117/12.2665859
Event: 9th Symposium on Novel Photoelectronic Detection Technology and Applications (NDTA 2022), 2022, Hefei, China

Abstract

According to the request for large-scale and high-efficiency transmission grating for astronomical ground-based telescope spectrographs, we report a method to control the duty cycle during the fabrication of deep-etched grating on fused silica substrate by holograph and ion-beam etching simply and conveniently. Simulation shows that 98% diffraction efficiency is achieved under Littrow conditions when groove depth is about 830nm, ridge width is about 240nm (duty cycle is about 0.60) at a wavelength of 400nm. In this work, we successfully manufactured serval gratings with different duty cycle controlled by exposure dose and thickness of chromium layer on the photoresist mask and achieved a high depth-to-width ratio deep-etched grating with the Cr-photoresist double mask at optimal grating period and groove depth for efficiency based on simulation results. It lays an essential foundation for the realization of large-area deep etching grating, which can be used in huge telescopes in the future.

Citation Download Citation

Manman Sun, Shuhu Huan, Zhiwen Chen, Hengbo Li, Liangcheng Yu, and Keqiang Qiu "Fabrication of deep-etched fused silica grating with high depth-to-width ratio by holograph and ion-beam etching", Proc. SPIE 12617, Ninth Symposium on Novel Photoelectronic Detection Technology and Applications, 1261738 (4 April 2023); https://doi.org/10.1117/12.2665859

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