Near-IR diode laser system for emission and process control

Henrik Ahlberg; Stefan Helge Lundqvist; Torbjoern Andersson; Robert Tell

doi:10.1117/12.20344

1 August 1990 Near-IR diode laser system for emission and process control

Henrik Ahlberg, Stefan Helge Lundqvist, Torbjoern Andersson, Robert Tell

Author Affiliations +

Proceedings Volume 1269, Environment and Pollution Measurement Sensors and Systems; (1990) https://doi.org/10.1117/12.20344
Event: The International Congress on Optical Science and Engineering, 1990, The Hague, Netherlands

Abstract

In this paper a near-JR diode laser system for emission and process control has been designed and tested. The system utilizes derivative spectroscopy to increase the sensitivity of the measurement due to the low line strengths of the absorption lines in the 0.7 - 1.7 p.m wavelengths region. A minimum detectable absorbance of 2 iO-5 was obtained at an integration time of 3 ms. Oxygen was used in the experiments and the corresponding minimum detectable concentration was 200 ppm. No interference effects was observed from co-existing emission gases. The system utilizes a unique modulation concept for compensation of non'gas-related transmission variations in the measurement path. Due to the short response time the system is very useful for on-line process control.

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Henrik Ahlberg, Stefan Helge Lundqvist, Torbjoern Andersson, and Robert Tell "Near-IR diode laser system for emission and process control", Proc. SPIE 1269, Environment and Pollution Measurement Sensors and Systems, (1 August 1990); https://doi.org/10.1117/12.20344

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