PLISD: a new high-vacuum sputtering technique for thin film deposition

Liang Shi

doi:10.1117/12.20376

1 August 1990 PLISD: a new high-vacuum sputtering technique for thin film deposition

Liang Shi

Proceedings Volume 1270, Optical Thin Films and Applications; (1990) https://doi.org/10.1117/12.20376
Event: The International Congress on Optical Science and Engineering, 1990, The Hague, Netherlands

Abstract

A new sputtering technique (PLISD: Pulsed-Laser Induced Sputtering Deposition) for thin film deposition is reported. Instead of the glow discharges of usual sputtering processes, PLISD uses a pulsed laser and an electrically conductive target for the generation of the bombarding ions. Its features and possible advantages are indicated, among which is the possibility to carry out sputtering deposition in a high-vacuum environment. Some preliminary experimental results are given which demonstrate the feasibility of the PLISD technique.

Citation Download Citation

Liang Shi "PLISD: a new high-vacuum sputtering technique for thin film deposition", Proc. SPIE 1270, Optical Thin Films and Applications, (1 August 1990); https://doi.org/10.1117/12.20376

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