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I would like to take a few moments this morning to talk about a subject that I have heard alluded to several times during this conference, and over the past several months. And that is this. It would be nice to have a water soluble, water developable material compatible with water soluble etches for electron beam applications and indeed this has been looked at over the past several years. I would like to share some thoughts with you on the chemistry of those systems and why the AZ materials perform the way they do in the electron beam machines. And some possible solutions to those problems that we, as well as several other companies, are actively pursuing.
Larry Thompson
"Electronic beam resist performance of Novolac-based materials", Proc. SPIE 12807, Bay Area Chrome Users Society Symposium 1983, 128070B (10 October 2023); https://doi.org/10.1117/12.3011325
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Larry Thompson, "Electronic beam resist performance of Novolac-based materials," Proc. SPIE 12807, Bay Area Chrome Users Society Symposium 1983, 128070B (10 October 2023); https://doi.org/10.1117/12.3011325