Selective laser etching of displays: closing the gap between optical simulations and fabrication

Martin Wimmer; Myriam Kaiser; Jonas Kleiner; Jannis Wolff; Max Kahmann; Daniel Flamm

doi:10.1117/12.3000501

12 March 2024 Selective laser etching of displays: closing the gap between optical simulations and fabrication

Martin Wimmer, Myriam Kaiser, Jonas Kleiner, Jannis Wolff, Max Kahmann, Daniel Flamm

Author Affiliations +

Proceedings Volume 12872, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXIX; 1287206 (2024) https://doi.org/10.1117/12.3000501
Event: SPIE LASE, 2024, San Francisco, California, United States

Abstract

Simulations and measurements on selective laser etching of display glasses are reported. By means of a holographic 3D beam splitter, ultrashort laser pulses are focused inside the volume of a glass sample creating type III modifications along a specific trajectory like pearls on a string. Superimposed by a feed of the glass sample a full 3D area of modifications is achieved building the cornerstone for subsequent etch processes. Based on KOH the modifications are selectively etched at a much higher rate compared to unmodified regions resulting in a separation of the glass along the trajectory of modifications. For gaining further insight into the etch process, we perform simulations on this wet chemical process and compare it to our experimental results.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Martin Wimmer, Myriam Kaiser, Jonas Kleiner, Jannis Wolff, Max Kahmann, and Daniel Flamm "Selective laser etching of displays: closing the gap between optical simulations and fabrication", Proc. SPIE 12872, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXIX, 1287206 (12 March 2024); https://doi.org/10.1117/12.3000501

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