A high-tolerance-multi-step-long-period diffraction grating for InP/SiPh integrated lasers

Masahiro Matsuura; Masakazu Takabayashi; Satoshi Nishikawa; Yosuke Suzuki; Junichi Suzuki; Koichi Akiyama

doi:10.1117/12.2692254

12 March 2024 A high-tolerance-multi-step-long-period diffraction grating for InP/SiPh integrated lasers

Masahiro Matsuura, Masakazu Takabayashi, Satoshi Nishikawa, Yosuke Suzuki, Junichi Suzuki, Koichi Akiyama

Proceedings Volume 12889, Integrated Optics: Devices, Materials, and Technologies XXVIII; 128890R (2024) https://doi.org/10.1117/12.2692254
Event: SPIE OPTO, 2024, San Francisco, California, United States

Conference Poster

Abstract

We present a high-tolerance multi-step-long-period diffraction grating (MSLP-DG) for the integration of III-V and silicon photonics (SiPh). The MSLP-DG can be easily fabricated on III-V chips and enables efficient emission of diffraction light from the facet of III-V chips through its multi-step and long-period structure. An optical coupling is achieved by combining III-V chips with MSLP-DG and SiPh chips with conventional diffraction gratings. Compared with the direct butt-coupling scheme between waveguides, the grating coupler offers a larger beam size, allowing improved misalignment tolerance. The fabricated grating coupler demonstrates tolerances of over ±3.5 μm in both vertical and horizontal directions, enabling cost-effective passive assembly. As a proof-of-concept experiment, we fabricated and operated an InP-SiPh integrated external cavity wavelength-tunable laser (ECTL) using an MSLP-DG. This work demonstrates the potential application of the proposed MSLP-DG for the cost-effective integration of III-V and SiPh in various integrated devices.

Citation Download Citation

Masahiro Matsuura, Masakazu Takabayashi, Satoshi Nishikawa, Yosuke Suzuki, Junichi Suzuki, and Koichi Akiyama "A high-tolerance-multi-step-long-period diffraction grating for InP/SiPh integrated lasers", Proc. SPIE 12889, Integrated Optics: Devices, Materials, and Technologies XXVIII, 128890R (12 March 2024); https://doi.org/10.1117/12.2692254

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