EUV scatterometry: low-dose characterization of polymer-based metamaterials

Nicholas W. Jenkins; Yuka Esashi; Yunzhe Shao; Michael Tanksalvala; Henry C. Kapteyn; Margaret M. Murnane; Matthew Atkinson

doi:10.1117/12.3009911

9 April 2024 EUV scatterometry: low-dose characterization of polymer-based metamaterials

Nicholas W. Jenkins, Yuka Esashi, Yunzhe Shao, Michael Tanksalvala, Henry C. Kapteyn, Margaret M. Murnane, Matthew Atkinson

Author Affiliations +

Proceedings Volume 12955, Metrology, Inspection, and Process Control XXXVIII; 1295513 (2024) https://doi.org/10.1117/12.3009911
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

We present recent experiments conducted with our tabletop EUV reflectometer to characterize the detailed geometry, composition, and topography of several nanostructured, polymer-based samples. The EUV measurements are performed without sample damage or any significant sample preparation. Correlative STEM measurements confirm the EUV results, but require extensive sample preparation.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Nicholas W. Jenkins, Yuka Esashi, Yunzhe Shao, Michael Tanksalvala, Henry C. Kapteyn, Margaret M. Murnane, and Matthew Atkinson "EUV scatterometry: low-dose characterization of polymer-based metamaterials", Proc. SPIE 12955, Metrology, Inspection, and Process Control XXXVIII, 1295513 (9 April 2024); https://doi.org/10.1117/12.3009911

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