Vertical structured organic-inorganic EUV photoresist fabricated by molecular layer deposition

Jaehyuk Lee; Hyeonseok Ji; Sangmin Lee; Myung Mo Sung

doi:10.1117/12.3010671

10 April 2024 Vertical structured organic-inorganic EUV photoresist fabricated by molecular layer deposition

Jaehyuk Lee, Hyeonseok Ji, Sangmin Lee, Myung Mo Sung

Proceedings Volume 12957, Advances in Patterning Materials and Processes XLI; 129571V (2024) https://doi.org/10.1117/12.3010671
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

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Abstract

We developed a new concept of organic-inorganic hybrid multi-layer EUV PR with a vertical molecular wire structure. Organic-inorganic hybrid multi-layers are deposited by sequential deposition of organic and inorganic molecules. And each organic and inorganic layer has a specific function. Each inorganic layer can have special functions such as high EUV absorbance, high electron reactivity, and etch resistance, and the components and composition of each layer can be freely changed to achieve high EUV sensitivity and excellent plasma etching resistance. In addition, by introducing organic molecules between inorganic molecules, horizontal cross-linking is limited, making it possible to grow a thin film with a vertical molecular wire structure with a spacing between molecular wires of 1 nm or less. And thereby an exceptionally low LER can be generated.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Jaehyuk Lee, Hyeonseok Ji, Sangmin Lee, and Myung Mo Sung "Vertical structured organic-inorganic EUV photoresist fabricated by molecular layer deposition", Proc. SPIE 12957, Advances in Patterning Materials and Processes XLI, 129571V (10 April 2024); https://doi.org/10.1117/12.3010671

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