Post-fabrication tuning of photonic integrated circuits via silicon ion implantation

Akhil Varri; Shabnam Taheriniya; Frank Brückerhoff-Plückelmann; Wolfram H. P. Pernice

doi:10.1117/12.3022486

18 June 2024 Post-fabrication tuning of photonic integrated circuits via silicon ion implantation

Akhil Varri, Shabnam Taheriniya, Frank Brückerhoff-Plückelmann, Wolfram H. P. Pernice

Proceedings Volume 13012, Integrated Photonics Platforms III; 130120J (2024) https://doi.org/10.1117/12.3022486
Event: SPIE Photonics Europe, 2024, Strasbourg, France

Abstract

Integrated photonic circuits represent a significant advancement in optical technology, providing notable benefits in speed, efficiency, and miniaturization. By consolidating various optical components onto a single chip, these circuits enable precise manipulation and control of light. As a result, they are playing a pivotal role in technologies such as high-speed data interconnects, sensors, artificial intelligence accelerators, and quantum computing. However, one of the key challenges that hinders the widespread adoption of integrated optics is fabrication imperfections. This work¹ highlights a scalable and non-volatile technique for post-fabrication tuning of photonic computational memories by automated silicon ion implantation to precisely align high-quality resonant devices to targeted wavelengths. Spectral shifts ranging from less than 10 pm to several nanometers are obtained showing long-term stability while adding negligible loss.

Conference Presentation

Citation Download Citation

Akhil Varri, Shabnam Taheriniya, Frank Brückerhoff-Plückelmann, and Wolfram H. P. Pernice "Post-fabrication tuning of photonic integrated circuits via silicon ion implantation", Proc. SPIE 13012, Integrated Photonics Platforms III, 130120J (18 June 2024); https://doi.org/10.1117/12.3022486

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