Improvement of on-chip terahertz spectroscopy by nanometer-scale control of electron-beam lithography

Leon Olde Scholtenhuis; Kenichi Karatsu; David J. Thoen; Louis H. Marting; Jochem J. A. Baselmans; Sten Vollebregt; Akira Endo

doi:10.1117/12.3017946

24 August 2024 Improvement of on-chip terahertz spectroscopy by nanometer-scale control of electron-beam lithography

Leon Olde Scholtenhuis, Kenichi Karatsu, David J. Thoen, Louis H. Marting, Jochem J. A. Baselmans, Sten Vollebregt, Akira Endo

Author Affiliations +

Proceedings Volume 13092, Space Telescopes and Instrumentation 2024: Optical, Infrared, and Millimeter Wave; 1309277 (2024) https://doi.org/10.1117/12.3017946
Event: SPIE Astronomical Telescopes + Instrumentation, 2024, Yokohama, Japan

Conference Poster

Abstract

For the realization of high spectral sensitivity octave-wide bandwidth investigations in the millimeter-submillimeter spectrum, Integrated superconducting spectrometers (ISSs) such as the Deep Spectroscopic High-redshift Mapper (DESHIMA) (Endo et al., 2019) rely more and more on state-of-the-art nanofabrication. In these ISSs, the spectral resolution and sensitivity are determined by superconductive bandpass filters which are sensitive to nanometer-scale size variations between themselves. This limits the quality of the science data provided by the spectrometer. Here we demonstrate significant enhancements in the DESHIMA filter bank performance by addressing stitching issues in the electron beam lithography and by using a reduced electron beam step size. By measuring multiple device iterations under terahertz illumination, we were able to show a substantial increase in the usable spectrum fraction (USF) from 62% to 94%. Providing valuable insights into the development of the next-generation ISSs and other frequency-sensitive on-chip applications.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Leon Olde Scholtenhuis, Kenichi Karatsu, David J. Thoen, Louis H. Marting, Jochem J. A. Baselmans, Sten Vollebregt, and Akira Endo "Improvement of on-chip terahertz spectroscopy by nanometer-scale control of electron-beam lithography", Proc. SPIE 13092, Space Telescopes and Instrumentation 2024: Optical, Infrared, and Millimeter Wave, 1309277 (24 August 2024); https://doi.org/10.1117/12.3017946

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE