Metalens response to process variation

Andrew M. C. Dawes; Lawrence S. Melvin III; Maryvonne Chalony; Betsy Grubbs; Phil Stopford; Jian Rao; Rajeev Ranjan; Joachim Siebert; JiSoo Park; Ying Zhou

doi:10.1117/12.3034641

12 November 2024 Metalens response to process variation

Andrew M. C. Dawes, Lawrence S. Melvin III, Maryvonne Chalony, Betsy Grubbs, Phil Stopford, Jian Rao, Rajeev Ranjan, Joachim Siebert, JiSoo Park, Ying Zhou

Author Affiliations +

Proceedings Volume 13216, Photomask Technology 2024; 132161F (2024) https://doi.org/10.1117/12.3034641
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Abstract

Metalenses are flat lenses made from thin films with sub-wavelength nano-optical structures that can be created using the same processes that have been developed for integrated circuit manufacturing. We present a workflow that simulates the manufacturing process and enables process engineers and optical designers to study the impact of manufacturing on metalens performance without waiting for multiple manufacture-and-test cycles. To demonstrate this workflow, we design several metalenses and characterize the impact of process variation on absolute focusing efficiency, transmission, and output electric field.

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(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

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Andrew M. C. Dawes, Lawrence S. Melvin III, Maryvonne Chalony, Betsy Grubbs, Phil Stopford, Jian Rao, Rajeev Ranjan, Joachim Siebert, JiSoo Park, and Ying Zhou "Metalens response to process variation", Proc. SPIE 13216, Photomask Technology 2024, 132161F (12 November 2024); https://doi.org/10.1117/12.3034641

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