Paper
18 September 2024 Quantitative access to phase effects in High-NA photomasks using AIMS EUV
Matthias Roesch, Grizelda Kersteen, Andreas Verch, Maximilian Albert, Philip Heringlake, Klaus Gwosch, Renzo Capelli
Author Affiliations +
Proceedings Volume 13273, 39th European Mask and Lithography Conference (EMLC 2024); 132731G (2024) https://doi.org/10.1117/12.3029952
Event: 39th European Mask and Lithography Conference (EMLC 2024), 2024, Grenoble, France
Abstract
The upcoming introduction of High-NA EUV lithography in chip manufacturing is accompanied by still ongoing activities to mitigate the imaging issues combined with the 3D photomask absorber. Besides suitable exposure and patterning techniques, the mask absorber material has large impact on image contrast and the usable depth of focus. In recent years, 3D mask effects in EUV lithography have widely been investigated, and alternative absorber stacks which enable improved contrast and focus control have been proposed. The study of solutions to the challenges combined with the EUV reflective mask typically is based on rigorous imaging simulations. However, aerial image metrology can be a supplementary way to verify the impact of mask 3D effects on lithography. For this purpose, the AIMS® EUV actinic mask measurement represents a highly precise way to qualify the High-NA mask printing performance under scanner-equivalent optical column conditions.
In this paper, we present an AIMS® EUV study of the impact of mask 3D effects on the through-focus image formation in a three-beam interference regime. Our experiments on a dense vertical 20nm lines and spaces clip using dedicated monopole illumination demonstrate a prominent, focus-dependent line shape deformation for each of the single pole positions. For the center monopole setting, frequency doubling of the aerial image is observed for one particular focus value. To describe the line shapes recorded, we applied an analytical model for three-beam-imaging in the presence of defocus and mask 3D effects. We obtained an excellent agreement between measurements and calculated data that allows us to derive the mutual phase-shifts of the single interference cross-terms involved. We conclude that the aerial image behavior as observed can be traced back to a coupling of the defocus aberration and mask 3D driven effects.
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Matthias Roesch, Grizelda Kersteen, Andreas Verch, Maximilian Albert, Philip Heringlake, Klaus Gwosch, and Renzo Capelli "Quantitative access to phase effects in High-NA photomasks using AIMS EUV", Proc. SPIE 13273, 39th European Mask and Lithography Conference (EMLC 2024), 132731G (18 September 2024); https://doi.org/10.1117/12.3029952
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KEYWORDS
3D mask effects

Light sources and illumination

Extreme ultraviolet

Diffraction

3D image processing

3D modeling

Phase shifts

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