Electrochromic properties and temperature dependence of chemically deposited Ni(OH)x thin films

Marcia C.A. Fantini; George H. Bezerra; C. R. C. Carvalho; Annette Gorenstein

doi:10.1117/12.49215

1 December 1991 Electrochromic properties and temperature dependence of chemically deposited Ni(OH)_x thin films

Marcia C.A. Fantini, George H. Bezerra, C. R. C. Carvalho, Annette Gorenstein

Proceedings Volume 1536, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion X; (1991) https://doi.org/10.1117/12.49215
Event: San Diego, '91, 1991, San Diego, CA, United States

Abstract

Thin films of Ni(OH)_x prepared by an alternately dipping deposition (ADD) technique onto ITO substrates present electrochromic efficiencies of 35 cm²/c and optical density variation around 30% on bleaching/coloring cycles in 0.1 M KOH solution. The dependence of the electrochromic performance on the stoichiometry, structure, and morphology of the studied material was investigated by means of variations on those properties induced by heat treatments. The ADD technique also allowed the growth of samples in a powder form that could be analyzed easily by TGA, DSC, and XRD. The results point out that changes in stoichiometry are followed by changes in structure and that the presence of OH radicals in this material is essential for the observation of electrochromic contrast.

Citation Download Citation

Marcia C.A. Fantini, George H. Bezerra, C. R. C. Carvalho, and Annette Gorenstein "Electrochromic properties and temperature dependence of chemically deposited Ni(OH)_x thin films", Proc. SPIE 1536, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion X, (1 December 1991); https://doi.org/10.1117/12.49215

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