Generation and laser diagnostic analysis of bismuth fluoride

Matthew J. Bohn; D. C. Berst; Ernest A. Dorko

doi:10.1117/12.58979

1 May 1992 Generation and laser diagnostic analysis of bismuth fluoride

Matthew J. Bohn, D. C. Berst, Ernest A. Dorko

Proceedings Volume 1628, Intense Laser Beams; (1992) https://doi.org/10.1117/12.58979
Event: OE/LASE '92, 1992, Los Angeles, CA, United States

Abstract

Bismuth fluoride, BiF, a possible energy acceptor molecule in a chemically-pumped donor- acceptor electronic transition laser has been produced in a flow tube reactor. A high voltage discharge was used to produce bismuth and fluorine atoms which combined to form ground state BiF(X). Laser induced fluorescence studies confirmed that BiF was formed following the discharge. A vibrational temperature of 581 +/- 35 K was measured.

Citation Download Citation

Matthew J. Bohn, D. C. Berst, and Ernest A. Dorko "Generation and laser diagnostic analysis of bismuth fluoride", Proc. SPIE 1628, Intense Laser Beams, (1 May 1992); https://doi.org/10.1117/12.58979

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