Optimization of mirror focusing of synchrotron x-ray sources: a test case at the ESRF

Michael Wulff

doi:10.1117/12.140514

25 February 1993 Optimization of mirror focusing of synchrotron x-ray sources: a test case at the ESRF

Michael Wulff

Proceedings Volume 1739, High Heat Flux Engineering; (1993) https://doi.org/10.1117/12.140514
Event: San Diego '92, 1992, San Diego, CA, United States

Abstract

The focusing of highly brilliant synchrotron insertion device beams necessitates very precise and stable beamline optics in order to conserve the high brilliance of the source. Moreover, the heat load on mirrors and monochromators may strongly degrade the brilliance in the focus. It is shown here that insertion devices on the borderline between undulators and wigglers 2.5 <EQ K <EQ 5.0 give the highest possible brilliance of the focus over the energy range 0 <EQ (epsilon) (keV) <EQ 40 keV and at a modest overall heat load. Installed on a low-(beta) site the high intrinsic collimation produces a small effective source size which can be imaged using spherical optics with nearly vanishing aberrations.

Citation Download Citation

Michael Wulff "Optimization of mirror focusing of synchrotron x-ray sources: a test case at the ESRF", Proc. SPIE 1739, High Heat Flux Engineering, (25 February 1993); https://doi.org/10.1117/12.140514

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