Using lasers to understand and control the chemistry of semiconductor-related precursors

Brent D. Koplitz; Valentin G. Panayotov; Kyle Hamar; Kurt Birdwhistell; Lynn Vogel Koplitz; Teresa L. T. Birdwhistell; Xiaodong Xu; Subhash Deshmukh; Jeffrey L. Brum; James Lee

doi:10.1117/12.142079

16 March 1993 Using lasers to understand and control the chemistry of semiconductor-related precursors

Brent D. Koplitz, Valentin G. Panayotov, Kyle Hamar, Kurt Birdwhistell, Lynn Vogel Koplitz, Teresa L. T. Birdwhistell, Xiaodong Xu, Subhash Deshmukh, Jeffrey L. Brum, James Lee

Author Affiliations +

Proceedings Volume 1804, Rapid Thermal and Laser Processing; (1993) https://doi.org/10.1117/12.142079
Event: Microelectronic Processing '92, 1992, San Jose, CA, United States

Abstract

We present results on the laser-induced photochemistry, ablation, and deposition of a variety of precursor compounds used for III-V semiconductor growth. With compounds such as monoethylarsine, triethylarsenic, and triethylgallium, our efforts are focused on using lasers to generate and detect atomic hydrogen, a species that is known to be a good radical scavenger in certain III-V semiconductor growth environments. We also present results on the laser ablation of inorganic salts that may be useful as precursors for III-V thin-film growth. Here, K₃Ga₃As₄ and K₂Ga₂Sb₄ are irradiated with various excimer laser wavelengths, and we report on the ablation and deposition chemistry induced by such radiation. The prognosis for viable film growth using this approach is also discussed. Finally, recent efforts involving the photochemistry and subsequent deposition characteristics of a Pt- containing organometallic compound, C₅H₅Pt(CH₃)₃, are presented.

Citation Download Citation

Brent D. Koplitz, Valentin G. Panayotov, Kyle Hamar, Kurt Birdwhistell, Lynn Vogel Koplitz, Teresa L. T. Birdwhistell, Xiaodong Xu, Subhash Deshmukh, Jeffrey L. Brum, and James Lee "Using lasers to understand and control the chemistry of semiconductor-related precursors", Proc. SPIE 1804, Rapid Thermal and Laser Processing, (16 March 1993); https://doi.org/10.1117/12.142079

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available