Advanced method for determining photoresist system capability

Wayne H. Ostrout; Thomas Brown; Stuart E. Brown

doi:10.1117/12.148935

4 August 1993 Advanced method for determining photoresist system capability

Wayne H. Ostrout, Thomas Brown, Stuart E. Brown

Proceedings Volume 1926, Integrated Circuit Metrology, Inspection, and Process Control VII; (1993) https://doi.org/10.1117/12.148935
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

The work described in this publication details a procedure to determine the capability of the photochemical system utilizing a combination sub-develop and sub-exposure technique. The development of the test procedure concentrated on the ability to minimize the degree of random noise associated with the given response function. A reduction in the noise level allowed for a maximum signal and thus, the ability to detect slight variations within the photochemical constituent. To accomplish this task with application into high volume manufacturing, a two-fold approach was initiated. The first approach utilized a multilevel statistical experimental design. Through the use of RSM, a model was developed to statistically interpret the response as a function of the input variables. The second approach utilized a series of 'single cell' experiments.

Citation Download Citation

Wayne H. Ostrout, Thomas Brown, and Stuart E. Brown "Advanced method for determining photoresist system capability", Proc. SPIE 1926, Integrated Circuit Metrology, Inspection, and Process Control VII, (4 August 1993); https://doi.org/10.1117/12.148935

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