Applications of an atomic force metrology system in semiconductor manufacturing

Jeanne E. Beacham; Francois M. Dumesnil; Barrie L. VanDevender

doi:10.1117/12.149000

4 August 1993 Applications of an atomic force metrology system in semiconductor manufacturing

Jeanne E. Beacham, Francois M. Dumesnil, Barrie L. VanDevender

Proceedings Volume 1926, Integrated Circuit Metrology, Inspection, and Process Control VII; (1993) https://doi.org/10.1117/12.149000
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

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Jeanne E. Beacham, Francois M. Dumesnil, and Barrie L. VanDevender "Applications of an atomic force metrology system in semiconductor manufacturing", Proc. SPIE 1926, Integrated Circuit Metrology, Inspection, and Process Control VII, (4 August 1993); https://doi.org/10.1117/12.149000

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