Images of dielectric film structures on reflecting substrates

J. Felix Aguilar; Eugenio R. Mendez

doi:10.1117/12.148944

4 August 1993 Images of dielectric film structures on reflecting substrates

J. Felix Aguilar, Eugenio R. Mendez

Proceedings Volume 1926, Integrated Circuit Metrology, Inspection, and Process Control VII; (1993) https://doi.org/10.1117/12.148944
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

A rigorous numerical technique to calculate images of optically thick one-dimensional objects as formed by an optical scanning microscope is presented. The geometry of the selected system allows us to simulate microscopes in various modes of image formation (coherent, partially coherent, bright-field, dark-field, and confocal). We consider the cases of s- and p- polarized illumination. The samples consist of dielectric film structures deposited on perfectly conducting flat substrates, and are characterized by the surface profile, the film thickness, and the complex refractive index of the dielectric. Examples of bright-field coherent images calculated with this technique are shown.

Citation Download Citation

J. Felix Aguilar and Eugenio R. Mendez "Images of dielectric film structures on reflecting substrates", Proc. SPIE 1926, Integrated Circuit Metrology, Inspection, and Process Control VII, (4 August 1993); https://doi.org/10.1117/12.148944

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