Understanding, quantifying, and reducing photospeed test error through technical partnerships and experimental design

Mark A. Wirzbicki; James S. Lekas; Jesus F. Cuellar; Charlie L. Paddock; Mark A. Seliger; Michael W. Stan

doi:10.1117/12.149005

4 August 1993 Understanding, quantifying, and reducing photospeed test error through technical partnerships and experimental design

Mark A. Wirzbicki, James S. Lekas, Jesus F. Cuellar, Charlie L. Paddock, Mark A. Seliger, Michael W. Stan

Author Affiliations +

Proceedings Volume 1926, Integrated Circuit Metrology, Inspection, and Process Control VII; (1993) https://doi.org/10.1117/12.149005
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

Technical requirements for advanced manufacturing processes require strict photoresist photospeed control. To meet this need, it is necessary to determine the error associated with measuring photospeed at both the photoresist supplier and user Fabs. This paper described two studies targeted at determining and improving the photospeed test error at both the supplier and user Fabs. The initial work focused on understanding each company's test methodologies, respective capabilities and sources of variation. This consisted of a 48-hour photospeed repeatability test during which process and environmental conditions were monitored. Through brainstorming and the results of the repeatability study, factors affecting the signal-to-noise were identified and evaluated in a designed experiment.

Citation Download Citation

Mark A. Wirzbicki, James S. Lekas, Jesus F. Cuellar, Charlie L. Paddock, Mark A. Seliger, and Michael W. Stan "Understanding, quantifying, and reducing photospeed test error through technical partnerships and experimental design", Proc. SPIE 1926, Integrated Circuit Metrology, Inspection, and Process Control VII, (4 August 1993); https://doi.org/10.1117/12.149005

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