Ion-assisted deposition of oxide films

Hedva Zipin; Orna Marcovitch; Y. Refaeli; Yigal Yadin; Zeev Klein

doi:10.1117/12.151104

13 August 1993 Ion-assisted deposition of oxide films

Hedva Zipin, Orna Marcovitch, Y. Refaeli, Yigal Yadin, Zeev Klein

Proceedings Volume 1972, 8th Meeting on Optical Engineering in Israel: Optoelectronics and Applications in Industry and Medicine; (1993) https://doi.org/10.1117/12.151104
Event: 8th Meeting in Israel on Optical Engineering, 1992, Tel Aviv, Israel

Abstract

Various oxide films were prepared by oxygen ion-assisted deposition. The ion source (Mark II Gridless Ion source, manufactured by Commonwealth Scientific Corp.) uses the End-Hall configuration and generates high-current, low-energy beams of ions. Films of TiO₂, SiO₂, Al₂O₃, Y₂O₃ were deposited on substrates in temperatures ranging from ambient to 200 degree(s)C. The films had a high index of refraction, were hard and adhered strongly to the substrates, as compared to conventionally deposited oxide films. Multilayers of TiO₂/SiO₂ were prepared giving hard and environmentally stable coatings.

Citation Download Citation

Hedva Zipin, Orna Marcovitch, Y. Refaeli, Yigal Yadin, and Zeev Klein "Ion-assisted deposition of oxide films", Proc. SPIE 1972, 8th Meeting on Optical Engineering in Israel: Optoelectronics and Applications in Industry and Medicine, (13 August 1993); https://doi.org/10.1117/12.151104

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