Photoresists based on chalcogenide glasses for submicron lithography

Illana Bar; Matvei Klebanov; Victor Lyubin; Salman Rosenwaks; S. Shtutina; V. Volterra

doi:10.1117/12.151100

13 August 1993 Photoresists based on chalcogenide glasses for submicron lithography

Illana Bar, Matvei Klebanov, Victor Lyubin, Salman Rosenwaks, S. Shtutina, V. Volterra

Proceedings Volume 1972, 8th Meeting on Optical Engineering in Israel: Optoelectronics and Applications in Industry and Medicine; (1993) https://doi.org/10.1117/12.151100
Event: 8th Meeting in Israel on Optical Engineering, 1992, Tel Aviv, Israel

Abstract

It is shown that the photosensitivity of photoresists based on chalcogenide glasses can be increased drastically (1000 times and more) using excitation by pulsed radiation of excimer laser. A model is developed that explains the increase in sensitivity. The main advantages of chalcogenide photoresists are discussed and conclusions are drawn on the prospects of these resists for submicron photolithography.

Citation Download Citation

Illana Bar, Matvei Klebanov, Victor Lyubin, Salman Rosenwaks, S. Shtutina, and V. Volterra "Photoresists based on chalcogenide glasses for submicron lithography", Proc. SPIE 1972, 8th Meeting on Optical Engineering in Israel: Optoelectronics and Applications in Industry and Medicine, (13 August 1993); https://doi.org/10.1117/12.151100

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