Paper
22 September 1993 Research and development of a new series of measuring instruments directly tracing to the wavelength
Hui-Fu Qiu, Xue-Neng Zhang
Author Affiliations +
Proceedings Volume 2101, Measurement Technology and Intelligent Instruments; (1993) https://doi.org/10.1117/12.156370
Event: Measurement Technology and Intelligent Instruments, 1993, Wuhan, China
Abstract
High uniformity of graduation is obtained in the wavelength unit length scales of measuring instrument. Developement of such series of instruments has been successful in new models of grating universal metroscope and vertical laser metroscope. The uniformity of spacing of wavelength grating developed is less than 0.03 μm. The uncertainty of these kinds of instruments is ±(O.2/O.3±2x 1OL) m. The real time comprehensive compensating method of measurement used in them can effectively compensate the linear systematic error and reduce requirements of temperature control of measuring environment.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hui-Fu Qiu and Xue-Neng Zhang "Research and development of a new series of measuring instruments directly tracing to the wavelength", Proc. SPIE 2101, Measurement Technology and Intelligent Instruments, (22 September 1993); https://doi.org/10.1117/12.156370
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KEYWORDS
Calibration

Environmental sensing

Instrument modeling

Temperature metrology

Control systems

Diffraction gratings

Diffraction

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