Paper
4 November 1994 Interpreting anisotropy and disturbances of optical properties of thin films in terms of layer microstructure
Francois Flory, Jean-Pierre Borgogno, D. Endelema, Emmanuel Rausa, Herve Rigneault, Antonella Rizzo
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Proceedings Volume 2253, Optical Interference Coatings; (1994) https://doi.org/10.1117/12.192065
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France
Abstract
Consequences of the columnar microstructure of dielectric thin films deposited by conventional vacuum evaporation are discussed. A model associated with the columns is used together with in situ and in air measurements to show that the anisotropy of Ion Assisted Deposited TiO2 films changes with ion energy. Moreover TiO2 and Ta2O5 layers deposited by conventional evaporation present reversible disturbances of their optical properties when illuminated with high power flux. A model taking into account both thermal and nonlinear properties (localized optical Kerr type effect) of the prism coupler system is used to explain the measurements and to estimate the nonlinear refractive index coefficient of different thin films.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Francois Flory, Jean-Pierre Borgogno, D. Endelema, Emmanuel Rausa, Herve Rigneault, and Antonella Rizzo "Interpreting anisotropy and disturbances of optical properties of thin films in terms of layer microstructure", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); https://doi.org/10.1117/12.192065
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KEYWORDS
Ions

Anisotropy

Refractive index

Thin films

Optical properties

In situ metrology

Water

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