Properties of rf magnetron-sputtered C and C:N thin films

Jaroslav Sobota; Jiri Hrdina; Vladimir Vorlicek; Ivan Gregora; Petr Siroky; Vratislav Perina

doi:10.1117/12.192091

4 November 1994 Properties of rf magnetron-sputtered C and C:N thin films

Jaroslav Sobota, Jiri Hrdina, Vladimir Vorlicek, Ivan Gregora, Petr Siroky, Vratislav Perina

Proceedings Volume 2253, Optical Interference Coatings; (1994) https://doi.org/10.1117/12.192091
Event: 1994 International Symposium on Optical Interference Coatings, 1994, Grenoble, France

Abstract

A series of nitrogenated and nitrogen-free carbon films was prepared under various deposition conditions (substrate temperatures between 40 - 535 degree(s)C and working gas pressures between 0.09 - 5.0 Pa). Rutherford backscattering, Raman scattering, surface profilometry, ellipsometry, hardness and adhesion measurements were performed and results were related to both nitrogen and oxygen content in the layers.

Citation Download Citation

Jaroslav Sobota, Jiri Hrdina, Vladimir Vorlicek, Ivan Gregora, Petr Siroky, and Vratislav Perina "Properties of rf magnetron-sputtered C and C:N thin films", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); https://doi.org/10.1117/12.192091

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