Sheath model of negatively biased substrate in vacuum arcs with cathode spots

Zhongyuan Cheng; Jiyan Zou

doi:10.1117/12.174620

1 May 1994 Sheath model of negatively biased substrate in vacuum arcs with cathode spots

Zhongyuan Cheng, Jiyan Zou

Proceedings Volume 2259, XVI International Symposium on Discharges and Electrical Insulation in Vacuum; (1994) https://doi.org/10.1117/12.174620
Event: XVI International Symposium on Discharges and Electrical Insulation in Vacuum, 1994, Moscow-St. Petersburg, Russian Federation

Abstract

Plasma sheath near the substrate plays an important role in Vacuum Arc Deposition Technology (VADT). To analyze the sheath characteristics of the substrate in VADT, the unique ejection pattern of the cathode region must be taken into account. This paper describes a steady-state, two-dimension sheath model in which ions distribute specially according to a cosinoidal law. The model equations can be numerical soluted under specified conditions, to describe the sheath behavior of the substrate in the process of titanium film deposition using VADT. The model can be used for calculation of ion flux and heat flux flowing to the substrate in VADT, or in some other cases in which biased conductors were in vacuum arcs with cathode spots.

Citation Download Citation

Zhongyuan Cheng and Jiyan Zou "Sheath model of negatively biased substrate in vacuum arcs with cathode spots", Proc. SPIE 2259, XVI International Symposium on Discharges and Electrical Insulation in Vacuum, (1 May 1994); https://doi.org/10.1117/12.174620

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