CD data requirements for proximity effect corrections

Richard C. Henderson; Oberdan W. Otto

doi:10.1117/12.195817

7 December 1994 CD data requirements for proximity effect corrections

Richard C. Henderson, Oberdan W. Otto

Proceedings Volume 2322, 14th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.195817
Event: 14th Annual BACUS Symposium on Photomask Technology and Management, 1994, Santa Clara, CA, United States

Abstract

With i-line steppers and 0.5 micrometers lines the line size error due to the optical proximity effect is shown by simulation to be 35% - 60% of the CD error budget. Correcting for the error with individual feature biasing requires potentially thousands of line size measurements. Measuring only the isolated line or the equal line/gap pattern is insufficient. A minimal test pattern consists of 108 iterations of the dimensions and spacings of a three line pattern. Experimental measurements from this minimal set can be combined with simulation by anchoring and reshaping the more detailed simulation data.

Citation Download Citation

Richard C. Henderson and Oberdan W. Otto "CD data requirements for proximity effect corrections", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); https://doi.org/10.1117/12.195817

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