Yield enhancement with particle defects reduction

Kiyoshi Mori; Nam Nguyen; Dewey Keeton; Ross Burns

doi:10.1117/12.186772

14 September 1994 Yield enhancement with particle defects reduction

Kiyoshi Mori, Nam Nguyen, Dewey Keeton, Ross Burns

Proceedings Volume 2334, Microelectronics Manufacturability, Yield, and Reliability; (1994) https://doi.org/10.1117/12.186772
Event: Microelectronic Manufacturing, 1994, Austin, TX, United States

Abstract

Contamination control is a major issue in VLSI fabrication. Particle control, in particular, is crucial to the success and profitability of the manufacturing process. While most production lines have a particle monitoring system, the direct correlation between defect level and device yield is not always obvious, and therefore prioritizing quick yield improvement efforts can be difficult. This paper discusses a solution with the total particle control system which has provided a practical method for yield enhancement.

Citation Download Citation

Kiyoshi Mori, Nam Nguyen, Dewey Keeton, and Ross Burns "Yield enhancement with particle defects reduction", Proc. SPIE 2334, Microelectronics Manufacturability, Yield, and Reliability, (14 September 1994); https://doi.org/10.1117/12.186772

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