Electron-beam microcolumn technology and applications

T.H. Philip Chang; Michael G.R. Thomson; M. L. Yu; Ernst Kratschmer; H. S. Kim; Kim Y. Lee; Stephen A. Rishton; Dieter P. Kern

doi:10.1117/12.221566

25 September 1995 Electron-beam microcolumn technology and applications

T.H. Philip Chang, Michael G.R. Thomson, M. L. Yu, Ernst Kratschmer, H. S. Kim, Kim Y. Lee, Stephen A. Rishton, Dieter P. Kern

Author Affiliations +

Proceedings Volume 2522, Electron-Beam Sources and Charged-Particle Optics; (1995) https://doi.org/10.1117/12.221566
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

A fully functional electron beam microcolumn, 3.5 mm in length, demonstrating a probe size of 10 nm and beam current >= 1 nA at 1 keV has been successfully developed. This paper presents its current status and future directions. Potential applications ranging from low cost scanning electron microscopy to arrays of such microcolumns for lithography, metrology, testing etc. will be discussed.

Citation Download Citation

T.H. Philip Chang, Michael G.R. Thomson, M. L. Yu, Ernst Kratschmer, H. S. Kim, Kim Y. Lee, Stephen A. Rishton, and Dieter P. Kern "Electron-beam microcolumn technology and applications", Proc. SPIE 2522, Electron-Beam Sources and Charged-Particle Optics, (25 September 1995); https://doi.org/10.1117/12.221566

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