Vacuum ultraviolet optical microscopy

James F. Young; H. M. Duiker; I. Ferincz; Tasshi Dennis

doi:10.1117/12.219574

15 September 1995 Vacuum ultraviolet optical microscopy

James F. Young, H. M. Duiker, I. Ferincz, Tasshi Dennis

Author Affiliations +

Proceedings Volume 2524, National Science Foundation (NSF) Forum on Optical Science and Engineering; (1995) https://doi.org/10.1117/12.219574
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

Microscopy using vacuum ultraviolet and soft x-ray radiation offers high resolution, high contrast, and chemical sensitivity. Holography and contact printing are unique in their potential to achieve wavelength-limited resolution because they eliminate optical elements and their imperfections. Both methods, however, lack magnification and require high resolution films and methods to recover images. We present our results on source development and film characterization.

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James F. Young, H. M. Duiker, I. Ferincz, and Tasshi Dennis "Vacuum ultraviolet optical microscopy", Proc. SPIE 2524, National Science Foundation (NSF) Forum on Optical Science and Engineering, (15 September 1995); https://doi.org/10.1117/12.219574

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