Aspheric surface figuring of silicon using plasma-assisted chemical etching

Steven J. Hoskins; Bradley A. Scott

doi:10.1117/12.218670

6 September 1995 Aspheric surface figuring of silicon using plasma-assisted chemical etching

Steven J. Hoskins, Bradley A. Scott

Proceedings Volume 2542, Optomechanical and Precision Instrument Design; (1995) https://doi.org/10.1117/12.218670
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

OCA Applied Optics has developed and demonstrated a rapid, automated technique for the surface figuring of precision aspheric silicon and silicon-clad optical elements using a patented plasma assisted chemical etching (PACE) methodology. In this paper we discuss the preprocessing methods and suitable PACE removal depth strategies to ensure that final PACE- finished silicon surfaces meet current low-scatter optical standards. An aspheric surface figuring model for the PACE process is also described.

Citation Download Citation

Steven J. Hoskins and Bradley A. Scott "Aspheric surface figuring of silicon using plasma-assisted chemical etching", Proc. SPIE 2542, Optomechanical and Precision Instrument Design, (6 September 1995); https://doi.org/10.1117/12.218670

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