Investigation of GMC for CD uniformity benefits

Christopher P. Braun; Michael W. Stohl; Anthony E. Novembre; Frederick R. Peiffer

doi:10.1117/12.228161

8 December 1995 Investigation of GMC for CD uniformity benefits

Christopher P. Braun, Michael W. Stohl, Anthony E. Novembre, Frederick R. Peiffer

Proceedings Volume 2621, 15th Annual BACUS Symposium on Photomask Technology and Management; (1995) https://doi.org/10.1117/12.228161
Event: 15th Annual BACUS Symposium on Photomask Technology and Management '95, 1995, Santa Clara, CA, United States

Abstract

Long used as a replacement for COP in making 1:1 photomasks, poly(glycidyl methacrylate- co-3-chlorostyrene) (GMC), a negative acting e-beam sensitive resist, has recently been under investigation for additional applications, such as tight tolerance CD masks and 5X reticles. The process for GMC is straightforward and resilient within a manufacturing operation. In addition, the required process dose of 2.5 (mu) C/c² does not affect exposure time in a limiting way. This study has demonstrated CD uniformity less than 30 nm 3-sigma and showing no CD deviation from 50% - 150% of nominal develop time. GMC shows linear CD growth with over-exposure in the range from 80% to 200% of nominal, with X vs. Y CD tuning accomplished by the use of MEBES auto-tap blanker setting. Preliminary defect results are presented and conclusions are drawn that consider GMC as an easy to use alternative for critical CD layers.

Citation Download Citation

Christopher P. Braun, Michael W. Stohl, Anthony E. Novembre, and Frederick R. Peiffer "Investigation of GMC for CD uniformity benefits", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); https://doi.org/10.1117/12.228161

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