Quality assurance of embedded attenuated phase-shift masks

Hiroyuki Miyashita; Hiroshi Fujita; Toshifumi Yokoyama; Naoya Hayashi; Hisatake Sano

doi:10.1117/12.228178

8 December 1995 Quality assurance of embedded attenuated phase-shift masks

Hiroyuki Miyashita, Hiroshi Fujita, Toshifumi Yokoyama, Naoya Hayashi, Hisatake Sano

Proceedings Volume 2621, 15th Annual BACUS Symposium on Photomask Technology and Management; (1995) https://doi.org/10.1117/12.228178
Event: 15th Annual BACUS Symposium on Photomask Technology and Management '95, 1995, Santa Clara, CA, United States

Abstract

Abstract not available.

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Hiroyuki Miyashita, Hiroshi Fujita, Toshifumi Yokoyama, Naoya Hayashi, and Hisatake Sano "Quality assurance of embedded attenuated phase-shift masks", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); https://doi.org/10.1117/12.228178

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