Low-pressure plasma processing for optoelectronics applications

Ludvik Martinu

doi:10.1117/12.229949

10 January 1996 Low-pressure plasma processing for optoelectronics applications

Ludvik Martinu

Proceedings Volume 2695, Functional Photonic and Fiber Devices; (1996) https://doi.org/10.1117/12.229949
Event: Photonics West '96, 1996, San Jose, CA, United States

Abstract

Low pressure plasma can effectively be used for the fabrication of films for optical waveguides and for the patterning of photonic devices. The present paper describes the basic physical and chemical processes during the plasma deposition of passive waveguides, particularly of silicon compound layers such as silicon oxide, nitride and oxynitrides. We give an overview of the effects of discharge parameters (reactor design, gas composition, energy of bombarding ions, substrate temperature) on the optical properties of the waveguide materials, and their relation to the microstructural and mechanical characteristics. Advances in plasma- fabricated photonic devices on silicon substrates are discussed.

Citation Download Citation

Ludvik Martinu "Low-pressure plasma processing for optoelectronics applications", Proc. SPIE 2695, Functional Photonic and Fiber Devices, (10 January 1996); https://doi.org/10.1117/12.229949

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