Approaches explored for producing a variety of ion-assisted deposited thin film coatings using an end-Hall ion source

Michael L. Fulton; Davood Heshmaty-Manesh; Raymond Mitchell

doi:10.1117/12.246808

19 August 1996 Approaches explored for producing a variety of ion-assisted deposited thin film coatings using an end-Hall ion source

Michael L. Fulton, Davood Heshmaty-Manesh, Raymond Mitchell

Author Affiliations +

Proceedings Volume 2776, Developments in Optical Component Coatings; (1996) https://doi.org/10.1117/12.246808
Event: Optical Instrumentation and Systems Design, 1996, Glasgow, United Kingdom

Abstract

The variety of optical components produced using this ion- assisted-deposition (IAD) technique, spans a wide ken of applications: immersed beamsplitters; band pass and edge filters; laser filters; IR windows; durable anti-reflection filters, fiber optics, and enhanced metals. Each product type has a specific set of constraints that establishes the design and production strategy: substrate type, material indices, intrinsic stress, temperature, distribution, uniformity, thickness monitoring, spectral performance specification, and environmental requirements. The end-Hall IAD processes were performed using an ion-beam current of approximately one Ampere over a range of 40 to 120eV, providing a uniform ion current density impinging on a large substrate area. Compared to films deposited using either conventional physical vapor deposition, or standard gridded ion sources, this process produces optically stable films with abroad ion-beam that is well suited for volume manufacturing of complex optical coatings.

Citation Download Citation

Michael L. Fulton, Davood Heshmaty-Manesh, and Raymond Mitchell "Approaches explored for producing a variety of ion-assisted deposited thin film coatings using an end-Hall ion source", Proc. SPIE 2776, Developments in Optical Component Coatings, (19 August 1996); https://doi.org/10.1117/12.246808

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