Silicate glass film deposition from gas discharge initiated by laser plasma

Valerie A. Astapenko; Oleg E. Sidoryuk

doi:10.1117/12.232211

11 March 1996 Silicate glass film deposition from gas discharge initiated by laser plasma

Proceedings Volume 2777, ALT'95 International Symposium on Advanced Materials for Optics and Optoelectronics; (1996) https://doi.org/10.1117/12.232211
Event: ALT '95 International Conference: Advanced Materials for Optics and Optoelectronics, 1995, Prague, Czech Republic

Abstract

Investigations devoted to the silicate glass film deposition from gas discharge initiated by laser plasma are presented. Tetraethylorthosilicate (TEOS) is introduced in the gas composition. It was the source of the SiO₂. Addition of the other components of the deposited coatings comes from the laser plume of the ablated solid state target.

Citation Download Citation

Valerie A. Astapenko and Oleg E. Sidoryuk "Silicate glass film deposition from gas discharge initiated by laser plasma", Proc. SPIE 2777, ALT'95 International Symposium on Advanced Materials for Optics and Optoelectronics, (11 March 1996); https://doi.org/10.1117/12.232211

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