Paper
20 March 1997 Evaluation of local contact stress/strain by moire interferometry and thin-coating photoelasticity
Meiko Naito, Yasushi Takeuchi, Masahisa Takashi
Author Affiliations +
Proceedings Volume 2921, International Conference on Experimental Mechanics: Advances and Applications; (1997) https://doi.org/10.1117/12.269792
Event: International Conference on Experimental Mechanics: Advances and Applications, 1996, Singapore, Singapore
Abstract
It is well known that there still exist several difficulties in the analysis of contact stress or strain around the region near contact because of unexpected irregular boundary data obtained by the current experimental techniques, such as Moire interferometry, in spite of highly accurate and precise information of continuous distribution of fringes inside a body. In order to overcome the type of difficulties, a combined technique with Moire interferometry and thin-coating photoelasticity is discussed to analyze stress/strain near a contact region, utilizing their features in either macro- or micro-scopic analysis of displacement and strain distribution the surface of a body.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Meiko Naito, Yasushi Takeuchi, and Masahisa Takashi "Evaluation of local contact stress/strain by moire interferometry and thin-coating photoelasticity", Proc. SPIE 2921, International Conference on Experimental Mechanics: Advances and Applications, (20 March 1997); https://doi.org/10.1117/12.269792
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KEYWORDS
Photoelasticity

Deflectometry

Moire patterns

Diffraction gratings

Fringe analysis

Coating

Analytical research

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