Amorphous Se/CdSe and SiOx/CdSe multilayers

Mihai A. Popescu; F. Sava; A. Lorinczi; Elena Vateva; D. Nesheva; G. Tchaushev; Ion N. Mihailescu; P.-J. Koch; S. Obst; H. Bradaczek

doi:10.1117/12.312698

2 July 1998 Amorphous Se/CdSe and SiO_x/CdSe multilayers

Mihai A. Popescu, F. Sava, A. Lorinczi, Elena Vateva, D. Nesheva, G. Tchaushev, Ion N. Mihailescu, P.-J. Koch, S. Obst, H. Bradaczek

Author Affiliations +

Proceedings Volume 3405, ROMOPTO '97: Fifth Conference on Optics; (1998) https://doi.org/10.1117/12.312698
Event: ROMOPTO '97: Fifth Conference on Optics, 1997, Bucharest, Romania

Abstract

Amorphous multilayers based on Se and CdSe alternated sublayers were successfully prepared by thermal vacuum evaporation and laser ablation with the periodicity of 22 nm. The multilayer structure is stable up to approximately 70 degree(s)C. In the samples prepared by laser ablation a large contraction of the multilayer stacking occurs by annealing. Amorphous SiO_x/CdSe multilayers with the periodicity of approximately 15 nm were successfully prepared by thermal vacuum evaporation. The structure is stable up to 400 degree(s)C annealing temperature. Pulse excimer laser irradiation of the SiO_x based multilayer produces an expansion of the interlayer distance with approximately 0.33%.

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Mihai A. Popescu, F. Sava, A. Lorinczi, Elena Vateva, D. Nesheva, G. Tchaushev, Ion N. Mihailescu, P.-J. Koch, S. Obst, and H. Bradaczek "Amorphous Se/CdSe and SiO_x/CdSe multilayers", Proc. SPIE 3405, ROMOPTO '97: Fifth Conference on Optics, (2 July 1998); https://doi.org/10.1117/12.312698

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