Development of a fast beam-blanking system

Munehiro Ogasawara; Hitoshi Sunaoshi; Ryoji Yoshikawa

doi:10.1117/12.328808

1 September 1998 Development of a fast beam-blanking system

Munehiro Ogasawara, Hitoshi Sunaoshi, Ryoji Yoshikawa

Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998) https://doi.org/10.1117/12.328808
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan

Abstract

In order to obtain a precise dose control for proximity effect correction, a fast beam blanking system has been developed which can make possible the fine control of the beam pulse width with precision of less than 1 nanosecond. The system consists of a high precision blanker driving circuit and a blanking structure suitable for fast operation. The blanker driving circuit controls the pulse width by selecting delay line logic with required delay. The pulse width control of less than 1 nanosecond and pulse rising time of less than 10 nanoseconds were achieved. A coaxial structure was adopted for the blanking structure. The simulation study has shown that a blanking structure with low reflectance in a few GHz range is achievable. The pulse passed through an experimental blanking structure without distortion in waveform.

Citation Download Citation

Munehiro Ogasawara, Hitoshi Sunaoshi, and Ryoji Yoshikawa "Development of a fast beam-blanking system", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); https://doi.org/10.1117/12.328808

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