Modified particle detection method for reticle/mask particle detection system

Yoshinori Nagai; Toyoki Kanzaki

doi:10.1117/12.328840

1 September 1998 Modified particle detection method for reticle/mask particle detection system

Yoshinori Nagai, Toyoki Kanzaki

Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998) https://doi.org/10.1117/12.328840
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan

Abstract

A false detect in light scattering particle detection system is mainly caused by scattering light from densely designed pattern. HORIBA has developed a new signal processing method for particle detection systems in order to reduce false detect. This method reduce the scattering light signals form densely designed pattern in particular. This paper describes the method and the test result.

Citation Download Citation

Yoshinori Nagai and Toyoki Kanzaki "Modified particle detection method for reticle/mask particle detection system", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); https://doi.org/10.1117/12.328840

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