Use of KLA-Tencor STARlight SL 300 for in-process contamination inspection to control reticle defect densities

Duane Dutton; Wayne P. Shen; Richard Yee; James A. Reynolds

doi:10.1117/12.332817

18 December 1998 Use of KLA-Tencor STARlight SL 300 for in-process contamination inspection to control reticle defect densities

Duane Dutton, Wayne P. Shen, Richard Yee, James A. Reynolds

Author Affiliations +

Proceedings Volume 3546, 18th Annual BACUS Symposium on Photomask Technology and Management; (1998) https://doi.org/10.1117/12.332817
Event: 18th Annual BACUS Symposium on Photomask Technology and Management, 1998, Redwood City, CA, United States

Abstract

Control of defects on photomasks is becoming increasingly critical with smaller geometries, tighter specifications and optical proximity control (OPC). Additionally there are new phase shift (PSM) mask materials which are difficult, if not impossible to repair with today's equipment. This paper reports on using the KLA-Tencor STARlight SL 300 in several applications to improve first pass defect levels on photomasks. Two tests were run in which fully exposed reticles were inspected at several points in the PBS process to determine which process caused hard chrome defects at final inspection. In the first test, of 23 final defects, 9 were first seen after exposure (presumed on the raw blank), 2 after develop and 12 after bake. In the second, of 9 final defects, 6 were seen on raw blank, 1 after exposure and 2 after develop. Also reported is the use of the SL 300 to assist in an iterative process/equipment improvement for a strip cycle, resulting in 0 post strip defects in clear areas greater than or equal to 0.5 micrometer. Finally, raw mask blank inspection prior to writing is discussed. Data is presented on a lot of 10 plates in which 50% of the plates inspected did not meet the specification of 0 defects greater than or equal to 1.0 micrometer. The use of the SL 300 to 'cherrypick' blanks for difficult layers is discussed.

Citation Download Citation

Duane Dutton, Wayne P. Shen, Richard Yee, and James A. Reynolds "Use of KLA-Tencor STARlight SL 300 for in-process contamination inspection to control reticle defect densities", Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); https://doi.org/10.1117/12.332817

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KEYWORDS

Inspection

Reticles

Stereolithography

Photomasks

Defect inspection

Contamination

Etching

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