Si/Si1-xGex waveguide components for WDM demultiplexing

Siegfried Janz; Dan-Xia Xu; Jean-Marc Baribeau; Andre Delage; Robin L. Williams

doi:10.1117/12.342798

19 March 1999 Si/Si_1-xGe_x waveguide components for WDM demultiplexing

Siegfried Janz, Dan-Xia Xu, Jean-Marc Baribeau, Andre Delage, Robin L. Williams

Author Affiliations +

Proceedings Volume 3630, Silicon-based Optoelectronics; (1999) https://doi.org/10.1117/12.342798
Event: Optoelectronics '99 - Integrated Optoelectronic Devices, 1999, San Jose, CA, United States

Abstract

We report on the development of building blocks of Si/Si_{1- x}Ge_x/Si planar waveguide WDM circuits -- an optical splitter/combiner and the first demonstration of an Si/Si_{1- x}Ge_x/Si arrayed waveguide grating (AWG) demultiplexer. The prototype AWG is a four channel device with a 400 GHz ((Delta) (lambda) equals 2.3 nm) channel spacing, and operates in the 1300 nm wavelength range. Strain and refractive index in the Si_1-xGe_x epilayers play a critical role in device performance. The AWG waveguide heterostructure has total Si_1-xGe_x layer thickness well beyond the measured critical thickness for lattice relaxation, but is stabilized against dislocation formation by the insertion of Si capping layers during growth. Single mode curved ridge waveguides formed from this material show no obvious bend losses for radii of curvature as small as 4 mm.

Citation Download Citation

Siegfried Janz, Dan-Xia Xu, Jean-Marc Baribeau, Andre Delage, and Robin L. Williams "Si/Si_1-xGe_x waveguide components for WDM demultiplexing", Proc. SPIE 3630, Silicon-based Optoelectronics, (19 March 1999); https://doi.org/10.1117/12.342798

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