Evaluation of PAC performance in a thick film photoresist

Kathryn H. Jensen; Stanley A. Ficner; Yvette M. Perez

doi:10.1117/12.350253

11 June 1999 Evaluation of PAC performance in a thick film photoresist

Kathryn H. Jensen, Stanley A. Ficner, Yvette M. Perez

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350253
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

In this paper we evaluate the photoactive compound (PAC) performance in a thick film photoresist. In an effort to report the performance of a thick film photoresist and the correlation to PAC structure, we have studied several formulations containing a monofunctional PAC(A) in comparison to a polyfunctional (PAC(B). We have seen that the use of a monofunctional photoactive compound provides for a high performance thick film photoresist with good profile, depth of focus, resolution, and exposure latitude. A polyfunctional PAC however, causes a loss in performance. The ratio of monofunctional PAC(A) to polyfunctional PAC(B) was varied and lithography was studied on a Nikon stepper (i-line). In our study, we evaluate the effect of the addition of PAC(B) to our formulations and the consequences in terms of lithographic performance.

Citation Download Citation

Kathryn H. Jensen, Stanley A. Ficner, and Yvette M. Perez "Evaluation of PAC performance in a thick film photoresist", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350253

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