Paper
25 August 1999 Novel inspection system with design rule check for high-accuracy reticles
Takayoshi Matsuyama, Kenichi Kobayashi, Daikichi Awamura, Katsuyoshi Nakashima, Yasunori Hada
Author Affiliations +
Abstract
A pattern defect inspection system (8MD93R) that features a new concept has been developed. The performance of the design rule check function (DRCF) which this inspection system features was evaluated using a test reticle with a special program defect. As a result, it was confirmed that DRCF made it possible to put pattern inspection that is free from false defects into practical use. Also, we determined the relationship between the image processing accuracy required for DRCF and the reticle defect detection performance. It was confirmed that DRCF could also be used to detect general reticle pattern defects and make an overlay check for a reticle and a reticle of different layer pattern.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takayoshi Matsuyama, Kenichi Kobayashi, Daikichi Awamura, Katsuyoshi Nakashima, and Yasunori Hada "Novel inspection system with design rule check for high-accuracy reticles", Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); https://doi.org/10.1117/12.360228
Lens.org Logo
CITATIONS
Cited by 2 patents.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Inspection

Reticles

Defect detection

Defect inspection

Computer aided design

Semiconducting wafers

Manufacturing

RELATED CONTENT

Inspection of OPC reticle for 0.18-um-rule devices
Proceedings of SPIE (December 18 1998)
Printability and detection of backside defects on photomasks
Proceedings of SPIE (October 13 2011)
Cleaning and pelliclization
Proceedings of SPIE (January 01 1994)
Manufacturing and inspection of assist-bar-type OPC mask
Proceedings of SPIE (September 05 2001)
Alternating phase-shift masks for contact patterning
Proceedings of SPIE (June 26 2003)
Defect inspection capability for advanced OPC photomasks
Proceedings of SPIE (December 18 1998)

Back to Top