Overlay metrology productivity and stability enhancements using an offline recipe database manager (RDM)

Stephen J. DeMoor; Robert M. Peters; Todd E. Calvert; Stephanie L. Hilbun; George P. Beck III; Kristi L. Bushman; Russell D. Fields

doi:10.1117/12.386456

2 June 2000 Overlay metrology productivity and stability enhancements using an offline recipe database manager (RDM)

Stephen J. DeMoor, Robert M. Peters, Todd E. Calvert, Stephanie L. Hilbun, George P. Beck III, Kristi L. Bushman, Russell D. Fields

Author Affiliations +

Proceedings Volume 3998, Metrology, Inspection, and Process Control for Microlithography XIV; (2000) https://doi.org/10.1117/12.386456
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Tool cost of ownership and manufacturing productivity continue to be key factors in equipment selection discussions. Products that differentiate themselves by maximizing tool utilization and minimizing engineering resources make the best economic impact in a time of increasing fab capital costs. This paper will demonstrate the use of a single off-line recipe database manager (RDM) in conjunction with multiple optical misregistration measurement tools for the purpose of misregistration recipe creation and management in a high volume ASIC manufacturing line. A strategy for minimizing the number of recipe elements and the amount of time required to create and maintain all recipes will be discussed. Data will be presented which demonstrates significant reduction in tool time required for recipe setup, leading directly to increased tool availability for production use. In addition, the RDM allows for standardization of misregistration measurement setup for similar process levels across multiple product devices within a single product family. Data will be shown demonstrating TIS stability and consistency as a result of the standardized setup. Future work, including fully automated recipe creation via CAD output data would be discussed.

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Stephen J. DeMoor, Robert M. Peters, Todd E. Calvert, Stephanie L. Hilbun, George P. Beck III, Kristi L. Bushman, and Russell D. Fields "Overlay metrology productivity and stability enhancements using an offline recipe database manager (RDM)", Proc. SPIE 3998, Metrology, Inspection, and Process Control for Microlithography XIV, (2 June 2000); https://doi.org/10.1117/12.386456

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KEYWORDS

Databases

Overlay metrology

Semiconducting wafers

Manufacturing

Metrology

Chlorine

Pattern recognition

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