Recent Developments In Antireflective - Interference - Layer-Systems

Eckart K. Hussmann; Roland Schnabel

doi:10.1117/12.935486

18 September 1983 Recent Developments In Antireflective - Interference - Layer-Systems

Eckart K. Hussmann, Roland Schnabel

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Proceedings Volume 0400, New Optical Materials; (1983) https://doi.org/10.1117/12.935486
Event: 1983 International Technical Conference/Europe, 1983, Geneva, Switzerland

Abstract

Two special methods were developed to produce antireflective - interference - layer-systems. One is the dip coating process - an additive method. The other method is the neutral solution process - a substractive method. The antireflective layers from both processes are well suited for high power laser systems. A method is described to measure a refractive index gradient in thin layers - as for example leached layers.

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Eckart K. Hussmann and Roland Schnabel "Recent Developments In Antireflective - Interference - Layer-Systems", Proc. SPIE 0400, New Optical Materials, (18 September 1983); https://doi.org/10.1117/12.935486

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