Current status of NGL masks

David M. Walker

doi:10.1117/12.392098

19 July 2000 Current status of NGL masks

David M. Walker

Proceedings Volume 4066, Photomask and Next-Generation Lithography Mask Technology VII; (2000) https://doi.org/10.1117/12.392098
Event: Photomask and Next Generation Lithography Mask Technology VII, 2000, Kanagawa, Japan

Abstract

The manufacture of Next Generation Lithography reticles presents many challenges. Extremely small critical dimension and image placement error budgets; novel substrates including membranes and multi-layer reflective coatings; and inspection, detection and repair of subresolution defects will force revolutionary change in the infrastructure of mask technology. This paper surveys current NGL mask designs, structures, materials and manufacturing capabilities. Results from mask fabrication, physical modeling, error budget analysis and extensive experience in building X-Ray membrane masks are presented to develop process learning plans to meet future product specifications.

Citation Download Citation

David M. Walker "Current status of NGL masks", Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); https://doi.org/10.1117/12.392098

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available