Evaluation of overlay performance by using air shower at the prealignment

Amit Ghosh; Yew-Kong Tan; D. Arunagiri Rajan; Gin Ping Sun

doi:10.1117/12.436733

22 August 2001 Evaluation of overlay performance by using air shower at the prealignment

Amit Ghosh, Yew-Kong Tan, D. Arunagiri Rajan, Gin Ping Sun

Proceedings Volume 4344, Metrology, Inspection, and Process Control for Microlithography XV; (2001) https://doi.org/10.1117/12.436733
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

This paper demonstrates the impact of introducing air-shower unit over the stepper prealignment module on the overlay performance of 0.35micrometers process technology. There is a overall improvement in overlay by 8-12nm for the FEOL process (poly to active) and 25-30nm improvement for W-CMP BEOL process .

Citation Download Citation

Amit Ghosh, Yew-Kong Tan, D. Arunagiri Rajan, and Gin Ping Sun "Evaluation of overlay performance by using air shower at the prealignment", Proc. SPIE 4344, Metrology, Inspection, and Process Control for Microlithography XV, (22 August 2001); https://doi.org/10.1117/12.436733

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KEYWORDS

Back end of line

Front end of line

Inspection

Metrology

Optical lithography

Process control

Quantum wells

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