Long pulse duration of F2 laser for 157-nm lithography

Hidenori Watanabe; Naoki Kitatochi; Kouji Kakizaki; Akifumi Tada; Jun Sakuma; Tatsuya Ariga; Kazuaki Hotta

doi:10.1117/12.435639

14 September 2001 Long pulse duration of F₂ laser for 157-nm lithography

Hidenori Watanabe, Naoki Kitatochi, Kouji Kakizaki, Akifumi Tada, Jun Sakuma, Tatsuya Ariga, Kazuaki Hotta

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435639
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

An ultra narrow line width of the F₂ laser, narrower than 0.2pm, is required for a CaF₂ only refractive optics exposure system. Also, a low peak laser power is needed for the extension of the optics lifetime. These ultra narrow line width and low peak power are achievable by long pulse duration. We, Association of Super-Advanced Electronics Technologies (ASET), are developing an ultra line narrowed F₂ laser below 0.2pm, with 5mJ high output energy, by adopting a 2-stage F₂ laser system, which consists of an oscillator and an amplifier. The oscillator for this 2-stage system is required to have an ultra narrow line width of below 0.2pm. We have developed F₂ laser with very long laser pulse duration of over 65ns (Tis: the integral squire pulse width), in a free running operation. And, by installing a line-narrowing module (LNM) in this F₂ laser, an ultra narrow line width of below 0.2 pm (FWHM, deconvolved) has been realized. This F₂ laser was successfully used for the oscillator of 2-stage system.

Citation Download Citation

Hidenori Watanabe, Naoki Kitatochi, Kouji Kakizaki, Akifumi Tada, Jun Sakuma, Tatsuya Ariga, and Kazuaki Hotta "Long pulse duration of F₂ laser for 157-nm lithography", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435639

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