Different conditioning and absorption behavior of fluoride material combinations for dielectric multilayers at 193 nm

Bincheng Li; S. Martin; Eberhard Welsch

doi:10.1117/12.425059

12 April 2001 Different conditioning and absorption behavior of fluoride material combinations for dielectric multilayers at 193 nm

Bincheng Li, S. Martin, Eberhard Welsch

Author Affiliations +

Proceedings Volume 4347, Laser-Induced Damage in Optical Materials: 2000; (2001) https://doi.org/10.1117/12.425059
Event: Laser-Induced Damage in Optical Materials: 2000, 2000, Boulder, CO, United States

Abstract

Pulsed surface thermal lens (TL) technique is used to investigate the laser conditioning and to measure the nonlinear absorption of LaF₃/MgF₂ dielectric multilayers deposited on CaF₂ substrate at 193 nm. The conditioning effect is monitored starting from the first shot of irradiation and in a shot-by-shot basis. The LaF₃/MgF₂ multilayers show a very strong conditioning. The ratio of the absorptions before and after the laser irradiation is approximately 4 - 8 for a highly reflective (LH)²⁰ LaF₃/MgF₂ multilayer, and approximately 4 for (1L3H)⁷ and (3L1H)⁷ multilayers. For comparison, a (LH)²⁰ LaF₃/AlF₃ multilayer shows only weak laser conditioning effect, with an absorption ratio of approximately 1.4. Our experimental results suggest that the strong conditioning effect of the LaF₃/MgF₂ multilayer is due to the possible interaction between the LaF₃ and MgF₂ layers, which results in considerable increase and conditionability effect of the LaF₃ absorption. The fluoride multilayers present non-negligible nonlinear absorption, and the two-photon absorption coefficient of the multilayers is estimated to be 5(DOT)10^-7cm/W.

Citation Download Citation

Bincheng Li, S. Martin, and Eberhard Welsch "Different conditioning and absorption behavior of fluoride material combinations for dielectric multilayers at 193 nm", Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); https://doi.org/10.1117/12.425059

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